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Low Temperature Method for CVD

Researchers have developed a method for conformally coating substrates with semiconductors at lower temperatures than is possible with conventional chemical vapor deposition.A method for conformally coating substrates with semiconductors at lower temperatures than is possible with conventional chemical vapor deposition (CVD). The deposited semiconductor can infiltrate very small voids and spaces so that it is possible to deposit onto very large areas within static, rolled-up substrates. -John Badding

Chemical Vapor Deposition

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